Please use this identifier to cite or link to this item: http://hdl.handle.net/1843/80337
Type: Artigo de Periódico
Title: Gate-tunable non-volatile photomemory effect in MoS2 transistors
Authors: Andreij de Carvalho Gadelha
Alisson Ronieri Cadore
Kenji Watanabe
Takashi Taniguchi
Ana Maria de Paula
Leandro Malard Moreira
Rodrigo Gribel Lacerda
Leonardo Cristiano Campos
Abstract: Non-volatile memory devices have been limited to flash architectures that are complex devices. Here, we present a unique photomemory effect in MoS 2 transistors. The photomemory is based on a photodoping effect—a controlled way of manipulating the density of free charges in monolayer MoS 2 using a combination of laser exposure and gate voltage application. The photodoping promotes changes on the conductance of MoS 2 leading to photomemory states with high memory on/off ratio. Such memory states are non-volatile with an expectation of retaining up to 50% of the information for tens of years. Furthermore, we show that the photodoping is gate-tunable, enabling control of the recorded memory states. Finally, we propose a model to explain the photodoping, and we provide experimental evidence supporting such a phenomenon. In summary, our work includes the MoS 2 phototransistors in the non-volatile memory devices and expands the possibilities of memory application beyond conventional memory architectures.
Subject: Dispositivos optoeletrônicos
language: eng
metadata.dc.publisher.country: Brasil
Publisher: Universidade Federal de Minas Gerais
Publisher Initials: UFMG
metadata.dc.publisher.department: ICX - DEPARTAMENTO DE FÍSICA
Rights: Acesso Restrito
metadata.dc.identifier.doi: https://doi.org/10.1088/2053-1583/ab0af1
URI: http://hdl.handle.net/1843/80337
Issue Date: 2019
metadata.dc.url.externa: https://iopscience.iop.org/article/10.1088/2053-1583/ab0af1
metadata.dc.relation.ispartof: 2D Materials
Appears in Collections:Artigo de Periódico

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