SU-8 GPON diplexer based on H-line lithography by direct laser writer

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dc.creatorJhonattan Córdoba Ramírez
dc.creatorCélio Antonio Finardi
dc.creatorRoberto Ricardo Panepucci
dc.date.accessioned2025-04-07T14:19:16Z
dc.date.accessioned2025-09-09T00:39:18Z
dc.date.available2025-04-07T14:19:16Z
dc.date.issued2017
dc.identifier.doihttps://doi.org/10.1109/LPT.2017.2781803
dc.identifier.issn1041-1135
dc.identifier.urihttps://hdl.handle.net/1843/81335
dc.languageeng
dc.publisherUniversidade Federal de Minas Gerais
dc.relation.ispartofIEEE Photonics technology letters
dc.rightsAcesso Restrito
dc.subjectPolímeros
dc.subjectTelecomunicações
dc.subject.otherOptical waveguides , Optical device fabrication , Couplings , Optical coupling , Optical variables measurement , Optical losses , Optical polarization
dc.subject.otherOptical polymers , waveguide couplers , diplexers , optical communications
dc.subject.otherDirect Laser Writer , Low Loss , Direct Coupling , Filter Design , Polymeric Devices , Visible Light , Optical System , Spin-coated , Hot Plate , Coupling Coefficient , Resonance Peak , Insertion Loss , Rectangular Waveguide , Coupling Loss , Polymer Technology , Passive Network , Coupling Length , Single Waveguide
dc.subject.othero Diplexer opera em dois sistemas ou um sistema de comunicação composto por dois pontos que comunicam entre si em ambas as direções, pode usar sinais de RF que são mixados e depois separados.
dc.titleSU-8 GPON diplexer based on H-line lithography by direct laser writer
dc.typeArtigo de periódico
local.citation.epage1
local.citation.issue2
local.citation.spage1
local.citation.volume30
local.description.resumoIn this letter, the design, fabrication, and characterization of an SU-8 GPON diplexer based on directional couplers are presented. The polymeric devices on SiO2/Si lower cladding substrate were directly written by introducing H-nu 470 photoinitiator, which provides substantial improvement in mechanical and thermal stability, reliability, and low loss, allowing flexible prototyping through H-line lithography at a 405-nm wavelength. Design of the filters and waveguide processing and fabrication are described, and the experimental results of the designed diplexer are shown.
local.publisher.countryBrasil
local.publisher.departmentENG - DEPARTAMENTO DE ENGENHARIA ELETRÔNICA
local.publisher.initialsUFMG
local.url.externahttps://ieeexplore.ieee.org/abstract/document/8172044

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