Use este identificador para citar ou linkar para este item: http://hdl.handle.net/1843/62219
Tipo: Artigo de Periódico
Título: High throughput investigation of an emergent and naturally abundant 2D material: clinochlore
Autor(es): Raphaela de Oliveira Gonçalves
Matheus Josué de Souza Matos
Ângelo Malachias de Souza
Klaus Wilhelm Heinrich Krambrock
Ingrid David Barcelos
Luis Antonio Guallichico Guallichico
Eduardo Policarpo Magalhães Campos
Alisson Ronieri Cadore
Raul de Oliveira Freitas
Francisco Mateus Cirilo da Silva
Verônica de Carvalho Teixeira
Roberto Magalhães Paniago
Helio Chacham
Resumo: Phyllosilicate minerals, which form a class of naturally occurring layered materials (LMs), have been recently considered as a low-cost source of two-dimensional (2D) materials. Clinochlore [Mg5Al(AlSi3)O10(OH)8] is one of the most abundant phyllosilicate minerals in nature, exhibiting the capability to be mechanically exfoliated down to a few layers. An important characteristic of clinochlore is the natural occurrence of defects and impurities which can strongly affect their optoelectronic properties, possibly in technologically interesting ways. In the present work, we carry out a thorough investigation of the clinochlore structure on both bulk and 2D exfoliated forms, discussing its optical features and the influence of the insertion of impurities on its macroscopic properties. Several experimental techniques are employed, followed by theoretical first-principles calculations considering several types of naturally-ocurring transition metal impurities in the mineral lattice and their effect on electronic and optical properties. We demonstrate the existence of requirements concerning surface quality and insulating properties of clinochlore that are mandatory for its suitable application in nanoelectronic devices. The results presented in this work provide important informations for clinochlore potential applications and establish a basis for further works that intend to optimize its properties to relevant 2D technological applications through defect engineering.
Assunto: Minerais
Filossilicatos
Idioma: eng
País: Brasil
Editor: Universidade Federal de Minas Gerais
Sigla da Instituição: UFMG
Departamento: ICX - DEPARTAMENTO DE FÍSICA
Tipo de Acesso: Acesso Restrito
Identificador DOI: https://doi.org/10.1016/j.apsusc.2022.153959
URI: http://hdl.handle.net/1843/62219
Data do documento: 2022
metadata.dc.url.externa: https://www.sciencedirect.com/science/article/pii/S0169433222015021
metadata.dc.relation.ispartof: Applied Surface Science
Aparece nas coleções:Artigo de Periódico

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