Utilização da espectroscopia de emissão ótica para o controle automático de plasma em processos de deposição física de vapores

Abstract

The quality of the final product of process of physical vapor deposition (PVD), by sputtering, depends on the control of machine parameters such as gas injection process, pressure of the vacuum chamber and plasma generator power influencing the characteristics of plasma Sputtering. An important parameter that interferes with measurable properties of the plasma is the concentration of gases used in their generation. Among such properties measured, the optical emission of the active species in the plasma environment can be monitored via optical emission spectroscopy, which allows us to measure the proportion of species in this environment. Within this context, will be presented in this paper the implementation of system for automatic control of the process of Plasma Sputtering accomplished in a Physical Vapour Deposition BAS450 using optical emission spectrometry. The results indicate robustness and efficiency of the model and the proposed technique.